Electrical and Photoelectrical Properties of Copper (II) Complex/n-Si/Au Heterojunction Diode
Cihat Ozaydin,
Kemal Akkilic
Issue:
Volume 2, Issue 6, December 2014
Pages:
69-74
Received:
28 August 2014
Accepted:
6 October 2014
Published:
15 January 2015
DOI:
10.11648/j.ajop.20140206.11
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Abstract: In this study, we fabricated copper(II) complex/n-Si/Au organic-inorganic heterojunction diode by forming copper(II) complex thin film on n-type silicon. A direct optical band gap energy values of the copper(II) complex (Cu2C34H34N2O21Cl4) thin film on a glass substrate was obtained as Eg=2.98 eV. The current-voltage (I-V) measurement of the diode was carried out at room temperature and under dark. The ideality factor n and barrier height ϕb values of the diode were found to be 3.17 and 0.71 eV, respectively. The diode indicates non-ideal current-voltage characteristics due to the high ideality factor greater than unity. The series resistance Rs and ideality factor n values were determined using Cheung’s method and obtained as 5.54 kΩ and 3.81, respectively. The capacitance-voltage (C-V) measurements of the diode were performed at different frequency and room temperature. From the analysis of the C-V measurements carrier concentration Nd, diffusion potential Vd and barrier height values ϕbc-v were determined as 2.79x1015 cm-3, 1.078 V, 1.31 eV, respectively. From the I-V measurements of the diode under 1.5 AM illumination, short circuit current (Isc) and open circuit voltage (Voc) have been extracted as 12.8 µA and 153 mV, respectively.
Abstract: In this study, we fabricated copper(II) complex/n-Si/Au organic-inorganic heterojunction diode by forming copper(II) complex thin film on n-type silicon. A direct optical band gap energy values of the copper(II) complex (Cu2C34H34N2O21Cl4) thin film on a glass substrate was obtained as Eg=2.98 eV. The current-voltage (I-V) measurement of the diode ...
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